VACUUM FILM FORMING APPARATUS AND VACUUM FILM FORMING METHOD

摘要

A vacuum film forming apparatus (100) is provided with a vacuum chamber (20) inside of which can be depressurized; a substrate holder (12) for holding a substrate (11) in the vacuum chamber (20); a bias supply (V1) for applying a bias voltage to the substrate holder (12); a material holder (15) for arranging a reflection film material wherein bismuth is added to silver; and a material discharging means for discharging the material from the material holder (15) toward the substrate and ionizing the material for discharging the material. A reflection film composed of the material is deposited on the substrate (11) by permitting kinetic energy of the ionized material to increase based on the bias voltage, and the reflectivity of the reflection film is adjusted based on the bias voltage and the quantity of the bismuth added.