发明名称 |
SLIP-RESISTANT GARMENT AND MANUFACTURING PROCESS THEREOF |
摘要 |
A slip-resistant garment may include: at least one textile structure; and/or at least one slip-resistant portion coupled to the at least one textile structure. The at least one slip-resistant portion may include at least one thermoplastic polymer selected from among: (a) block copolymers of styrene; (b) copolymers of ethylene with at least one C3-C12 alpha-olefin; (c) copolymers of at least one butene with at least one diene; or (d) copolymers of ethylene with at least one ester having an ethylene unsaturation selected from among: C1-C8 alkyl acrylate, C1-C8 alkyl methacrylates, or vinyl C2-C8 carboxylates. The copolymers of ethylene with at least one C3-C12 alpha-olefin further include at least one dienic termonomer. |
申请公布号 |
US2016167344(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201414908353 |
申请日期 |
2014.07.30 |
申请人 |
FAIT PLAST S.P.A. |
发明人 |
ARICI Andrea;ARICI Guido;DELLA PUPPA Stefano |
分类号 |
B32B25/10;A41B11/00;B32B25/14;B32B1/08;B32B7/08;A41D1/06;A41D1/04 |
主分类号 |
B32B25/10 |
代理机构 |
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代理人 |
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主权项 |
1. A slip-resistant garment, comprising:
at least one textile structure; and at least one slip-resistant portion coupled to the at least one textile structure; wherein the at least one slip-resistant portion comprises at least one thermoplastic polymer selected from among:
(a) block copolymers of styrene;(b) copolymers of ethylene with at least one C3-C12 alpha-olefin;(c) copolymers of at least one butene with at least one diene; or(d) copolymers of ethylene with at least one ester having an ethylene unsaturation selected from among: C1-C8 alkyl acrylate, C1-C8 alkyl methacrylates, or vinyl C2-C8 carboxylates. |
地址 |
Cellatica(BS) IT |