发明名称 BONDING PROCESS USING TEMPERATURE CONTROLLED CURVATURE CHANGE
摘要 A first substrate including a radius of curvature and a stressor layer is first provided. An outermost bowed, e.g., curved, surface of the first substrate is then brought into intimate contact with a surface of a second substrate. Bonding of the entirety of the first substrate to the second substrate is then achieved by reducing the radius of curvature of the first substrate by controlling the temperature at which bonding occurs.
申请公布号 US2016204078(A1) 申请公布日期 2016.07.14
申请号 US201514596861 申请日期 2015.01.14
申请人 International Business Machines Corporation 发明人 Bedell Stephen W.;Cheng Cheng-Wei;Fogel Keith E.;Li Ning;Sadana Devendra K.
分类号 H01L23/00;B32B37/14;B32B38/10 主分类号 H01L23/00
代理机构 代理人
主权项 1. A method of bonding a first substrate to a second substrate, said method comprising: providing a first substrate having a radius of curvature and containing a stressor layer; contacting an outermost bowed surface of said first substrate to a portion of a surface of a second substrate; and bonding said first substrate to an entirety of said surface of said second substrate, wherein said bonding is performed at a temperature that removes said radius of curvature of said first substrate.
地址 Armonk NY US