| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing device that can correct linear movability of a patterning head, thereby allowing a P2 step of removal machining to be performed with precision.SOLUTION: A device, which performs a patterning process of forming a groove in a substrate by moving relatively a patterning head to a stage at least in an uniaxial direction in a horizontal plane while the substrate is fixed to the stage, comprises a calibration line provided in the stage to extend in the uniaxial direction. The calibration line is imaged by imaging means while relatively moving the patterning head in the same manner as a case of the patterning process. Based on a displacement in a direction orthogonal to the uniaxial direction of the calibration line occurring in the obtained imaged image, a position for processing using a patterning tool during the patterning process is corrected. |
