摘要 |
A lithographic apparatus includes a control unit arranged to perform a first position measurement of the patterning device, apply an asymmetric acceleration profile to the support supporting the patterning device, perform a second position measurement of the patterning device, determine a slip characteristic of the pattering device based on the two position measurements and the applied acceleration profile, and perform a scanning exposure of a substrate taking into account the slip characteristic of the patterning device.
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