发明名称 最適撮像位置検出方法、最適撮像位置検出装置、フォトマスクの製造方法及び半導体装置の製造方法
摘要 According to one embodiment, an optimum imaging position detecting method includes acquiring an image of a predetermined area of a substrate surface, calculating, on the basis of the image of the predetermined area, peak intensity corresponding to a value obtained by subtracting average signal intensity of an area outside an intensity acquisition part from signal intensity of the intensity acquisition part, calculating variation of the peak intensity, executing acquiring the image of the predetermined area, calculating the peak intensity, and calculating the variation of the peak intensity at each of a plurality of imaging positions, and determining that a position of the maximum variation of the peak intensity is an optimum imaging position.
申请公布号 JP6009787(B2) 申请公布日期 2016.10.19
申请号 JP20120060832 申请日期 2012.03.16
申请人 株式会社東芝;大日本印刷株式会社 发明人 山根 武;寺澤 恒男
分类号 G02B7/28;G01N21/956 主分类号 G02B7/28
代理机构 代理人
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