| 发明名称 |
SUBSTRATE WETTABILITY-PROMOTING COMPOSITION, POLISHING COMPOSITION CONTAINING THE SAME, AND METHOD FOR PRODUCING SUBSTRATES USING THE SAME |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a high-quality substrate wettability-promoting composition that is free of or almost free of impurities.SOLUTION: The substrate wettability-promoting composition contains a hydrophilic component composed mainly of a cellulose derivative, and a solvent component. Impurities derived from the production of the cellulose derivative are equal to or less than 0.1 mass%. |
| 申请公布号 |
JP2014139258(A) |
申请公布日期 |
2014.07.31 |
| 申请号 |
JP20120283170 |
申请日期 |
2012.12.26 |
| 申请人 |
FUJIMI INC |
发明人 |
NAGAHARA KAYOKO;HIRANO KAZUYUKI;HORI KAZUNOBU |
| 分类号 |
C09K3/00;B24B37/00;C09K3/14;H01L21/304 |
主分类号 |
C09K3/00 |
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