发明名称 ELECTRODE PLATE FOR ION SOURCE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an electrode plate for an ion source which is higher in cooling effect and lower in price with no mixing of impurities such as a wax material in plasm, thermal deformation and leakage of a refrigerant. <P>SOLUTION: The electrode plate for the ion source which generates a high-speed ion beam by accelerating an ion in plasma comprises a plurality of cooling pipes 2 arranged in parallel with predetermined clearances; a plug 3 which closes openings of both ends of these respective cooling pipes 2; a holding material 4 holding both-end sides of these respective cooling pipes 2; a pair of headers 5 which are arranged in face to face with each other with predetermined intervals, support the respective cooling pipes 2 through the holding material of both-end sides, and supply/drain cooling water through a cooling hole provided in a communicative connecting manner at the respective cooling pipes 2. Each component of the respective cooling pipes, the plug, the holding material and the headers are integrally formed through the wax material applied to the joining faces, and the clearances between a plurality of the cooling pipes are formed as holes 2a to take out the ion beam. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005050600(A) 申请公布日期 2005.02.24
申请号 JP20030204347 申请日期 2003.07.31
申请人 TOSHIBA CORP 发明人 SHIBUYA SUMIICHI;ICHIHASHI KOJI;OKUYAMA TOSHIHISA;USHIJIMA MAKOTO
分类号 H05H1/22;H01J27/02;H01J37/08;H05H7/08 主分类号 H05H1/22
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