| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition which is properly stopped from bubbling while exhibiting effect as a surfactant. <P>SOLUTION: The polishing composition contains the surfactant which has a polyoxyalkylene main-chain skeleton having a substituent, organic acid, inorganic particles, hydrogen peroxide, and water. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
