发明名称 INTEGRATED INSPECTION SYSTEM AND DEFECT CORRECTION METHOD
摘要 <p>A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.</p>
申请公布号 WO2008085156(A1) 申请公布日期 2008.07.17
申请号 WO2007US00181 申请日期 2007.01.08
申请人 GENERAL ELECTRIC COMPANY;CAPALDO, KEVIN, PATRICK;CHEVERTON, MARK, ALLEN;COYLE, DENNIS, JOSEPH;DAVIS, MICHAEL, JOHN;TALSANIA, SAMEER, KIRTI;YAMADA, MASAKO;YEUNG, CHUNG-HEI 发明人 CAPALDO, KEVIN, PATRICK;CHEVERTON, MARK, ALLEN;COYLE, DENNIS, JOSEPH;DAVIS, MICHAEL, JOHN;TALSANIA, SAMEER, KIRTI;YAMADA, MASAKO;YEUNG, CHUNG-HEI
分类号 G01N21/95;H01L21/66 主分类号 G01N21/95
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