发明名称 MASK DEFECT INSPECTION APPARATUS AND MASK DEFECT INSPECTION PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To automatically divide an exposure mask into regions without requiring manual work of a worker by extracting and classifying a characteristic part of the mask pattern in the process of inspecting pattern defects in the exposure mask, and to improve inspection efficiency and its reliability or the like. <P>SOLUTION: The mask defect inspection apparatus to inspect pattern defects in an exposure mask is equipped with: a region dividing means 11 to divide the exposure mask into a region to which pattern structural elements consistent with specified conditions belong and other region; a defect inspection means 12 to inspect pattern defects by selectively using a plurality of kinds of inspection standards; and a reference instruction means 13 to instruct the defect inspection means to switch the inspection standard in each region based on the corresponding relational information between each region and the inspection standard. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005049611(A) 申请公布日期 2005.02.24
申请号 JP20030281492 申请日期 2003.07.29
申请人 SONY CORP 发明人 IWASE KAZUYA
分类号 G01N21/956;G03F1/84;H01L21/027;(IPC1-7):G03F1/08 主分类号 G01N21/956
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