PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a photomask blank and a method for manufacturing a photomask in which sufficient process accuracy with low dependence of pattern density is obtained in an etching process.

SOLUTION: The photomask blank is a raw material of a photomask having a mask pattern including a transparent area to exposure light and an effectively opaque area formed on a transparent substrate 1, and has a light shielding film 2 comprising a metal or a metal compound that can be etched by fluorine-based dry etching, particularly a material containing a transition metal and silicon, and an etching mask film 4 comprising a metal or a metal compound having durability against fluorine-based dry etching, formed on the light shielding film.

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