METHOD FOR MEASURING EXPOSURE DISTRIBUTION EUV OUT-OF-BAND AND TESTING PERFORMANCE OF EXTREME ULTRAVIOLET SCANNER SAME THE USING

摘要

The present invention relates to a method for measuring light intensity distribution out-of-band EUV and a method for testing performance of an EUV exposure device using the same. The method for testing performance of an EUV exposure device using the same comprises the steps of: measuring first exposure light intensity distribution of a first photoresist film; measuring second exposure intensity distribution of a second photoresist film in which an out-of-band EUV light removing layer is formed; and removing the second exposure intensity distribution from the first exposure intensity distribution.