| 摘要 |
PROBLEM TO BE SOLVED: To provide a large area sputtering target and its production method.SOLUTION: In the sputtering target including bonding between a compaction block 24 and a compaction block 26, each block includes alloy with a first metal and an additional alloy component, and the bonding is prepared without including any fine structure introduced from diffusion bonding of added and separated powder binder. A production method includes a step for performing hot isostatic pressing of a compaction preform block in which at least one continuous solid interface 28 part is inserted between compaction powder metal blocks 24 and 26 before pressing. The continuous solid interface 28 part includes a cold spray bodies 30a and 30b, and this is a dense body of powder precipitated in cold spray on a surface of one selected from the blocks 24 and 26, a sinter preform, the compressed powder body (for example, tile), or any combination thereof.SELECTED DRAWING: Figure 3 |
