发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection system has an illumination system (IL) with a polarization member (13). A plurality of directing elements (14a-14e) reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics (15) any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane. |
申请公布号 |
EP1826616(A2) |
申请公布日期 |
2007.08.29 |
申请号 |
EP20070250561 |
申请日期 |
2007.02.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MULDER, HEINE MELLE;EURLINGS, MARKUS FRANCISCUS ANTONIUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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