MULTILAYERED FILM MIRROR AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a multilayered film mirror having no illuminance irregularities depending on an incident angle. SOLUTION: An Si layer 11 and an Mo layer 12 are formed alternately by magnetron sputtering to form the multilayered film mirror 10 on a substrate 100. Since a diffusion layer 13 formed during film formation between the Si layer 11 and the Mo layer 12 has a property reducing a reflectivity of the multilayered film mirror 10, a film thickness distribution is provided in the in-plane direction of the diffusion layer 13 to correspond to a mirror peripheral part and a center part having each different incident angle of a soft X-ray R1. The reflectivity of the center part is lowered to be equal to the mirror peripheral part having a low incident angle, to thereby uniformize illuminance of reflected light R2. COPYRIGHT: (C)2008,JPO&INPIT