| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the vibration generated from the projecting-lens driving performed in a projecting optical system. <P>SOLUTION: In an exposure apparatus for exposing a wafer to an exposure light transmitted through a reticle via the projecting optical system having a lens driving mechanism for driving the projecting lens, a lens controlling portion so creates a lens driving signal for the lens driving mechanism as to control the lens driving mechanism. Also, an actuator controlling portion of the exposure apparatus creates an actuator driving signal for driving an actuator which so applies a controlling force directly or indirectly to the projecting optical system as to reduce the vibration caused by the projecting-lens driving performed by the lens driving mechanism based on the lens driving signal, and the actuator controlling portion controls the actuator. <P>COPYRIGHT: (C)2008,JPO&INPIT |
