| 摘要 |
The present invention relates to a method of measuring a thickness of a thin film. The method of measuring a thickness of a thin film comprises: a reflectance acquisition step, a refractive index assuming step, a conversion step, an error checking step, a phase extraction step, a phase restoring step, and a thickness calculation step. The reflectance acquisition step acquires a light intensity signal of a thin film, and acquires reflectance for the thin film by the light intensity signal. The refractive index assuming step assumes a refractive index of air and a refractive index of the thin film in real numbers, and a refractive index of a substrate on which the thin film is formed in a complex number. The conversion step converts the reflectance into normal reflectance. The error checking step checks whether a first difference value between a maximum value of the normal reflectance converted in the conversion step and a first reference value or a second difference value between a minimum value of the normal reflectance converted in the conversion step and a second reference value is within a predetermined error range. The phase extraction step extracts a phase if the first difference value or the second difference value is within the error range. The phase restoring step restores the phase extracted in the phase extraction step. The thickness calculation step calculates a thickness of the thin film from the phase restored in the phase restoring step. |
