PLASMA CLEANING DEVICE AND CLEANING METHOD OF SUBSTRATE FOR BLANKMASK USING THE SAME

摘要

The present invention provides a plasma cleaning apparatus and a cleaning method of a substrate for a blank mask using the same, which can minimize a production cost by enabling a substrate for a blank mask to be cleaned without a separate vacuum apparatus by using atmospheric plasma. The present invention can clean both surfaces of the substrate by using the atmospheric plasma cleaning apparatus, thereby preventing recontamination of the upper surface of the substrate, caused by diffusion of a contaminant of the lower surface of the substrate, which is generated in the cleaning process.