| 发明名称 |
COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN IN WHICH SAME IS USED |
| 摘要 |
This resist composition contains one or more components selected from among compounds represented by a specified formula, and resins obtained using the compounds as monomers. |
| 申请公布号 |
WO2016158168(A1) |
申请公布日期 |
2016.10.06 |
| 申请号 |
WO2016JP56332 |
申请日期 |
2016.03.02 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
TOIDA, Takumi;ECHIGO, Masatoshi;SATO, Takashi;SHIMIZU, Youko |
| 分类号 |
G03F7/004;C07D311/78;G03F7/039;G03F7/20;G03F7/26 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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