发明名称 SUBSTRATE-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a treating device capable of liquid-tightly connecting an external liquid supply pipe for supplying a treatment liquid to an internal liquid supply pipe provided in a chamber without welding to the rear plate of the chamber. SOLUTION: The treating device comprises: the chamber 25; the external liquid supply pipe 27 for supplying a treatment liquid to the chamber; the internal liquid supply pipe 28 for introducing the treatment liquid supplied to the external liquid supply pipe into the chamber; and a first connection section 26 for liquid-tightly connecting the external liquid supply pipe to the internal one at an opening 31 formed at the side plate of the chamber. The first connection section comprises: an external flange 32 to which the edge of the external liquid supply pipe is welded; an internal flange 33 to which the edge of the internal liquid supply pipe is welded; a screw 42 for fixing the external and internal flanges; a first sealing material 37 for securing the liquid-tight state between one flange and the side plate of the chamber; and a second sealing material 38 for securing the liquid-tight state of surfaces that oppose at the opening between the first and second flanges. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007220896(A) 申请公布日期 2007.08.30
申请号 JP20060039409 申请日期 2006.02.16
申请人 SHIBAURA MECHATRONICS CORP 发明人 HIROSE HARUMICHI;DOI SATOSHI
分类号 H01L21/027;H01L21/02;H01L21/304;H01L21/306 主分类号 H01L21/027
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