| 发明名称 |
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting |
| 摘要 |
A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero. |
| 申请公布号 |
US2009029630(A1) |
申请公布日期 |
2009.01.29 |
| 申请号 |
US20080232521 |
申请日期 |
2008.09.18 |
| 申请人 |
|
发明人 |
LIM YOUNG-SAM;LEE DONG-JUN;KIM NAM-SOO;MOON SUNG-TAEK;KANG KYOUNG-MOON;SO JAE-HYUN |
| 分类号 |
B24B37/00;B24B49/00;B24B37/013;B24B37/04;B24B37/20;B24B37/24;B24B41/06;B24D7/12;C08J5/14;C08L101/00;H01L21/304 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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