| 摘要 |
In one general aspect, an apparatus can include a first laser subsystem configured to transmit a first laser beam at a first location on an object at a time and a second laser subsystem configured to transmit a second laser beam at a second location on the object at the time. The apparatus can include an analyzer configured to calculate a first velocity based on a first reflected laser beam reflected from the object in response to the first laser beam. The analyzer can be configured to calculate a second velocity based on a second reflected laser beam reflected from the object in response to the second laser beam. The first location can be targeted by the first laser subsystem and the second location can be targeted by the second laser subsystem such that the first velocity is substantially the same as the second velocity. |
