| 发明名称 |
DEVICE AND METHOD FOR PROCESSING SUBSTRATE |
| 摘要 |
The present invention is to provide a substrate processing device capable of instantly drying liquid on a surface when drying a substrate, and a substrate processing method. The substrate processing device (10) includes an absorption-and-drying means (65) drying a surface of a substrate (W) by absorbing and drying a droplet of a volatile solvent formed on the substrate (W) through a heating effect by a heating means (64). |
| 申请公布号 |
KR20140114298(A) |
申请公布日期 |
2014.09.26 |
| 申请号 |
KR20140030244 |
申请日期 |
2014.03.14 |
| 申请人 |
SHIBAURA MECHATRONICS CORPORATION |
发明人 |
HAYASHI KONOSUKE;FURUYA MASAAKI;OOTAGAKI TAKASHI;NAGASHIMA YUJI;KINASE ATSUSHI;ABE MASAHIRO |
| 分类号 |
H01L21/302;H01L21/324 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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