| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. <P>SOLUTION: This laser is a production line machine with a master oscillator producing a very-narrow band seed beam amplified in the second discharge chamber. Especially, new controlling characteristics suitable for the two chamber gas discharge laser system include (1) pulse energy controlling with timing accuracy of nanosecond, (2) precise wavelength controlling between pulses by means of quick or ultra-quick wavelength adjustment, (3) quick responding gas temperature controlling, and (4) F<SB>2</SB>injection controlling by a new learning algorithm. <P>COPYRIGHT: (C)2007,JPO&INPIT |
