发明名称 PLASMA ABATEMENT USING WATER VAPOR IN CONJUNCTION WITH HYDROGEN OR HYDROGEN CONTAINING GASES
摘要 A plasma abatement process for abating effluent containing a PFC gas from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as an etch chamber, and reacts with the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the PFC gases and reacts them with a reagent, converting the effluent into compounds that are non-global warming and which may be easily removed by traditional facility water scrubbing technology. This disclosure explains methods to control the reagent hydrogen to oxygen ratio such that in addition to PFC destruction, the abated compounds have modified composition to enable extension of the maintenance interval for downstream supporting equipment.
申请公布号 WO2016099760(A1) 申请公布日期 2016.06.23
申请号 WO2015US61173 申请日期 2015.11.17
申请人 APPLIED MATERIALS, INC. 发明人 DICKINSON, COLIN JOHN
分类号 H01L21/3065;H01L21/67 主分类号 H01L21/3065
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