| 主权项 |
1. A manufacturing process for forming a touch structure, at least comprising the following steps:
S1: providing a substrate, wherein a sensing region and a trace region surrounding the sensing region are defined on the substrate; S2: forming an electrode layer on a substrate; S3: forming a first anti-etching optical layer on the electrode layer; S4: etching the electrode layer that is not covered by the first anti-etching optical layer, thereby dividing the electrode layer into an etched region and a non-etched region; S5: forming a second anti-etching optical layer on the first anti-etching optical layer and on the substrate, wherein the second anti-etching optical layer at least exposes parts of the first anti-etching optical layer within the trace region; S6: etching the first anti-etching optical layer that is not covered by the second anti-etching optical layer to expose the electrode layer of the non-etched region within the trace region; and S7: forming a trace layer disposed within the trace region, wherein the trace layer is electrically connected to the exposed electrode layer of the non-etched region. |
