发明名称 METHOD FOR PRODUCING SILICA-BASED PARTICLE DISPERSION
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a silica-based particle dispersion which is excellent in dispersion stability, exhibits high hydrophobicity, can be favorably used when a transparent resin film having high hardness is prepared, and is surface-treated.SOLUTION: A silica-based particle dispersion is obtained by mixing a trialkoxysilane compound having a (meth)acryloyl group, a trialkoxysilane compound having an alkyl group, and silica-based particles having an average particle diameter of 1-50 nm, and subjecting the mixed substance to surface treatment.SELECTED DRAWING: None
申请公布号 JP2016175790(A) 申请公布日期 2016.10.06
申请号 JP20150056462 申请日期 2015.03.19
申请人 SEIKO INSTRUMENTS INC 发明人 TAKAHASHI SHOTARO
分类号 C01B33/149 主分类号 C01B33/149
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