| 摘要 |
A method and apparatus of cleaning a substrate are provided to improve the efficiency of a cleaning process by using a non-newtonian fluid instead of a newtonian fluid. A chamber(402) is filled with a non-newtonian fluid. A predetermined substrate is loaded into the chamber. An additional non-newtonian fluid is compulsorily injected into the chamber to generate an aiming flow of the non-newtonian fluid. At least a portion of the flow of the non-newtonian fluid has a plug flow. The substrate is properly positioned in the chamber, so that the plug flow exists on an upper surface of the substrate. The plug flow is capable of removing particles from the upper surface of the substrate. |
