| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a method for judging light source quality applied to a photolithography process. <P>SOLUTION: The judging method comprises a step 300 to make an image sensor array expose to light from the light source, step 310 to collect addresses and individual light intensities corresponding to multiple positions on a pupil map that indicates the intensity of light thrown on the image sensor array from the light source, step 330 to define at least one of the internal curve and external curve of the pupil map based on the collected addresses and individual light intensities, and step 340 to apply the light source to the photolithography process, in the case where an address has a predetermined pattern for at least one curve of the internal curve and external curve. <P>COPYRIGHT: (C)2008,JPO&INPIT |
