ETCHING PROCESS OF THREE-DIMENSIONAL SHAPE MATERIAL

摘要

PURPOSE: An etching process of three-dimensional shape material is provided to solve problem on etchant infiltration at a part where a film is not properly attached when a three-dimensional shape material is etched by a conventional even etching technique. CONSTITUTION: An etching process of three-dimensional shape material comprises the steps of: adhering a photosensitive film on the surface of a material; selectively exposing the photosensitive film using an exposure mask and forming a modifying area for modifying the photosensitive film; removing the photosensitive film of the modifying area using a solution; and wet etching the material by using the modifying area as a mask.