发明名称 |
METHOD OF STEREOLITHOGRAPHY FABRICATION AND METHOD FOR PHOTO-CURING PHOTOSENSITIVE RESIN |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for curing a photosensitive resin by use of stereolithography fabrication.SOLUTION: The method includes steps of: producing a sub-pixel pattern having an outer contour region and an inner contour region based on a vector file acquired from a cross section of a model; providing a sub-pixel pattern to a photomask module 3, in which the photomask module 3 includes a panel 31 having a pixel matrix, the pixel matrix includes a plurality of square pixels, and each square pixel includes three color-filtered sub-pixels; flood-filling each color-filtered sub-pixel with a color to distinguish the outer contour region from the inner contour region; and exposing a photosensitive resin 41 to light from a light source 1 that emits light passing through the panel.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016173558(A) |
申请公布日期 |
2016.09.29 |
申请号 |
JP20160003774 |
申请日期 |
2016.01.12 |
申请人 |
NATIONAL TAIWAN UNIV OF SCIENCE & TECHNOLOGY |
发明人 |
JENG JENG-YWAN;RIMMA SHAFIKOVA;SU WEI-NIEN;HWANG BING-JOE |
分类号 |
G03F7/20;B29C35/08;B29C67/00;G02B3/08 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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