发明名称 METHOD OF STEREOLITHOGRAPHY FABRICATION AND METHOD FOR PHOTO-CURING PHOTOSENSITIVE RESIN
摘要 PROBLEM TO BE SOLVED: To provide a method for curing a photosensitive resin by use of stereolithography fabrication.SOLUTION: The method includes steps of: producing a sub-pixel pattern having an outer contour region and an inner contour region based on a vector file acquired from a cross section of a model; providing a sub-pixel pattern to a photomask module 3, in which the photomask module 3 includes a panel 31 having a pixel matrix, the pixel matrix includes a plurality of square pixels, and each square pixel includes three color-filtered sub-pixels; flood-filling each color-filtered sub-pixel with a color to distinguish the outer contour region from the inner contour region; and exposing a photosensitive resin 41 to light from a light source 1 that emits light passing through the panel.SELECTED DRAWING: Figure 1
申请公布号 JP2016173558(A) 申请公布日期 2016.09.29
申请号 JP20160003774 申请日期 2016.01.12
申请人 NATIONAL TAIWAN UNIV OF SCIENCE & TECHNOLOGY 发明人 JENG JENG-YWAN;RIMMA SHAFIKOVA;SU WEI-NIEN;HWANG BING-JOE
分类号 G03F7/20;B29C35/08;B29C67/00;G02B3/08 主分类号 G03F7/20
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