| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing agent for a synthetic quartz glass substrate, which prevents formation of defects, and contributes to improved yield in manufacturing etc. of a semiconductor device or a display panel. <P>SOLUTION: The polishing agent for the synthetic quartz glass substrate contains a colloidal solution and a polycarboxylic acid polymer, and has a colloid concentration of 20 to 50 mass%. By virtue of the polishing agent, in manufacturing of synthetic quartz glass available for the synthetic quartz glass substrate etc. for a photomask for use in a photolithography process that is important for manufacturing of an IC etc., formation of defects in a front surface of the synthetic quartz glass substrate, detected by a high-sensitive defect inspection device is prevented, and improved yield in manufacturing etc. of the semiconductor device is expected, which brings about further high definition of semiconductor manufacturing industry. Further, with respect to the synthetic quartz glass substrate for the photomask having a thick end face, for use in a display related-material, formation of defects in the process of polishing is prevented, which also leads to improved yield. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
