| 摘要 |
In a vacuum treating apparatus including a treating vessel with delivery port adapted to have a vacuum atmosphere and perform treatment by a treating gas and a delivery chamber with vacuum atmosphere connected via a gate chamber to the delivery port of the treating vessel and equipped with delivery means for the pass and receipt of substrate, any diffusion of gas remaining in the treating vessel into the delivery chamber is suppressed. The vacuum treating apparatus comprises the treating vessel, the delivery chamber and a gate valve provided in the gate chamber so that the delivery port is closed when the substrate is treated in the treating vessel while the delivery port is opened when the pass and receipt of substrate for the treating vessel are carried out. In order to suppress any diffusion of gas remaining in the treating vessel into the delivery chamber, the gate chamber is furnished, at its position facing the delivery port, with a gate chamber inert gas supply part and a gate chamber exhaust port adapted to produce a stream of inert gas. This suppresses any diffusion of gas remaining in the treating vessel through the delivery port into the delivery chamber. |
