| 摘要 |
The present invention is a photoresist composition comprising [A] a polymer component having a structural unit (I) represented by formula (1) and an acid-labile-group-containing structural unit (II) represented formula (2) in a single polymer or different polymers and [B] an acid generator. In formula (1), R0 represents a hydrogen atom, a fluorine atom, a hydroxy group, or a monovalent organic group having 1-20 carbon atoms; R1 and R2 independently represent a hydrogen atom, a fluorine atom, a hydroxy group, or a monovalent organic group having 1-20 carbon atoms, or R1 and R2 are bonded to each other to form, together with a carbon atoms to which R1 and R2 are bonded, a ring structure having 3-10 carbon atoms; and R3 and R4 independently represent a hydrogen atom, a fluorine atom, a hydroxy group, or a monovalent organic group having 1-20 carbon atoms, or R3 and R4 are bonded to each other to form, together with a carbon atom to which R3 and R4 are bonded, a ring structure having 3-10 carbon atoms; wherein at least one of R0 to R4 is a group containing a hetero atom. |
