发明名称 MULTI-LAYERED POLISHING PADS
摘要 A multi-layered polishing pad arrangement includes a first polishing pad layer having a first top and a first bottom major surface, a second polishing pad layer having a second top and a second bottom major surface, and a coupling arrangement disposed between the first bottom surface and the second top surface. The thickness of each of the first and second polishing pad layer ranges between 0.125 mm and 10 mm.
申请公布号 US2016229023(A1) 申请公布日期 2016.08.11
申请号 US201414915650 申请日期 2014.09.23
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 Lugg Paul S;Lehuu Duy K
分类号 B24B37/22;B24B7/20 主分类号 B24B37/22
代理机构 代理人
主权项
地址 Saint Paul MN US