发明名称 |
Inspection method and inspection apparatus |
摘要 |
The field of view of an objective lens is divided into two areas, and a transmission image of a photomask and a composite image obtained by optically synthesizing a transmission image and a reflection image of the photomask are picked up in parallel. A drop image generated at an edge portion of a pattern portion in the composite image is deleted by limiter processing or masking processing, or is deleted by using primary-differentiated signals of a composite image signal and a transmission image signal. |
申请公布号 |
US8879055(B1) |
申请公布日期 |
2014.11.04 |
申请号 |
US201414274919 |
申请日期 |
2014.05.12 |
申请人 |
Lasertec Corporation |
发明人 |
Suzuki Hironobu;Nakashima Katsuyoshi;Yamamoto Kazuhito |
分类号 |
G01N21/00;G01N21/956;G01N21/88 |
主分类号 |
G01N21/00 |
代理机构 |
Carrier Blackman & Associates, P.C. |
代理人 |
Carrier Blackman & Associates, P.C. ;Carrier Joseph P.;Blackman William D. |
主权项 |
1. An inspection apparatus that inspects a photomask having a pattern forming surface on which a pattern portion and a light-transmitting portion are formed, and a back surface opposed to the pattern forming surface, the inspection apparatus comprising:
an illumination optical system including: a transmitted illumination optical system that projects a transmitted illumination beam toward a back surface of a photomask to be inspected and illuminates a first area of the photomask; and a reflected illumination optical system that projects a reflected illumination beam toward an element forming surface of the photomask and illuminates a second area of the photomask, the second area being smaller than the first area and overlapping the first area in an optical axis direction; a detection system including: a first image pickup element that receives synthetic light of reflected light and transmitted light output from the second area of the photomask and picks up a composite image obtained by optically synthesizing a transmission image and a reflection image of the photomask; and a second image pickup element that receives transmitted light output from a third area of the photomask and picks up a transmission image of the photomask, the third area being a remaining area of the first area excluding the second area; and a signal processing device that is coupled to the detection system, processes an image signal output from the detection system, and outputs data indicating a defect, wherein the transmitted illumination optical system and the reflected illumination optical system are set so as to satisfy b2<b1, when a luminance value of an image of the pattern portion of the composite image is b1 and a luminance value of an image of the light-transmitting portion is b2, and the signal processing device includes:
a limiter processing unit that performs limiter processing on an image signal output from the first image pickup element to delete a signal portion having a luminance value equal to or smaller than a luminance value b0 that satisfies b2<b0<b1, or uniformly convert the signal portion into a signal having a luminance value equal to or smaller than a luminance value b1; anda defect detection unit that detects a defect by using a signal subjected to the limiter processing and an image signal output from the second image pickup element. |
地址 |
Kanagawa JP |