发明名称 WAFER TRANSFER APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a wafer transfer apparatus which can prevent damage to a wafer caused by the missing of particles of a substance constituting an attractor for attracting and holding the wafer. SOLUTION: The attractor 100 constituting the wafer transfer apparatus 1 is porously formed by the solid-phase sintering of a silicon carbide particle. Since a binder is not used, the particle constituting the attractor 100 is not internally provided in an unstable state, and the particle does not give any damage to the wafer W caused by being chopped on the wafer W. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006344778(A) 申请公布日期 2006.12.21
申请号 JP20050169274 申请日期 2005.06.09
申请人 DISCO ABRASIVE SYST LTD 发明人 TAKAZAWA TORU;YAMANAKA SATOSHI
分类号 H01L21/677;B25J15/06;B65G49/07 主分类号 H01L21/677
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