DEPOSITION APPARATUS AND DEPOSITION METHOD

摘要

According to one embodiment, a deposition apparatus includes a plasma gun, a detector, and a controller. The plasma gun is capable of ejecting a plasma gas, and is capable of forming a film on a work piece exposed to the plasma gas. The detector detects a temperature or a luminous intensity in the plasma gas in a direction of ejection of the plasma gas. The controller controls a distance between the work piece and the plasma gun based on the temperature or the luminous intensity obtained from the detector, so that the plasma gas has a temperature in a range from a first temperature to a second temperature or a luminous intensity in a range from a first luminous intensity to a second luminous intensity is irradiated to the work piece.

主权项

1. A deposition apparatus comprising:
a plasma gun being capable of ejecting a plasma gas, and being capable of forming a film on a work piece exposed to the plasma gas; a detector detecting a temperature or a luminous intensity in the plasma gas in a direction of ejection of the plasma gas; and a controller controlling a distance between the work piece and the plasma gun based on the temperature or the luminous intensity obtained from the detector, so that the plasma gas having a temperature in a range from a first temperature to a second temperature or a luminous intensity in a range from a first luminous intensity to a second luminous intensity being irradiated to the work piece.