| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold shape for forming a post-etching pattern with high precision, and an imprint method for this.SOLUTION: An imprint mold is used, which comprises: a base material; and convex portions 21A and 21B located in an uneven structure region set in one plane of the base material. The convex portions are arranged so that the minimum Lmin of an opposing distance between a side wall face of one convex portion of the convex portions adjacent and opposed to each other, and a side wall face of the other convex portion is 50 nm or less. A position where the opposing distance becomes the least is present at a location except a center portion of an opposing region over which the side wall faces are opposed to each other.SELECTED DRAWING: Figure 3 |
