发明名称 PHOTOCURABLE RESIN COMPOSITION, RESIN LAMINATE, AND METHOD FOR PRODUCING THE RESIN LAMINATE
摘要 PROBLEM TO BE SOLVED: To provide a resin laminate having cured coating film exhibiting sufficient antistaticity, also excellent in scratch resistance and transparency and suppressed in bleedout. SOLUTION: A photocurable resin composition is provided, comprising (A) a specific amount of a blend of each specific amount of (a-1) a polymerizable compound having in the molecule 2-4 (meth)acryloyloxy groups, (a-2) a compound having one ethylene-based unsaturated bond and (a-3) a polymerizable compound having in the molecule 5 or more (meth)acryloyloxy groups, (B) a specific amount of a copolymer obtained by copolymerization between each specific amount of (b-1) a quaternary ammonium salt group-bearing specific compound and (b-2) a one unsaturated double bond-bearing compound copolymerizable with the compound(b-1), (C) a specific amount of a photopolymerization initiator and (D) a specific amount of a hindered amine-based compound. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006342213(A) 申请公布日期 2006.12.21
申请号 JP20050167218 申请日期 2005.06.07
申请人 MITSUBISHI RAYON CO LTD 发明人 SUGAMOTO HIDEMASA
分类号 C08F2/44;B29C39/12;B29K33/04;B32B27/30;C08F2/50;C08F290/12 主分类号 C08F2/44
代理机构 代理人
主权项
地址