| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an elastic body used for an air-bag type polishing head which can improve the resistance to a grinding solution for turning into a prolonged lifetime. <P>SOLUTION: An elastic body 5 is provided on the side of the air-bag type polishing head of a polishing machine which polishes a wafer by chemical mechanical polishing. A first elastic film 11, making contact with the wafer and a second elastic film 12, making contact with a holding member 4 are stacked; the holding member 4 is disposed in the polishing head and holds the elastic body 5; the first elastic film 11 does not contain reinforcing particles and is made of vinyl chloride having high resistance to a grinding solution; and the second elastic film 12 contains reinforcing particles and is made of a rubber material having high mechanical strength. <P>COPYRIGHT: (C)2008,JPO&INPIT |
