METHOD AND APPARATUS FOR LASER OXIDATION AND REDUCTION REACTIONS

摘要

A method and apparatus using electromagnetic radiation and gas to create oxidation and reduction reactions on a device, such as a semiconductor wafer surface. In one embodiment, a scanned laser and gas may be employed in a number of oxidation and/or reduction reactions in a single system without using multiple pieces of equipment, corrosive chemicals and gases, high temperature and pressure chamber environments, waste treatment processes, and/or extra process steps typically required in existing processes.