发明名称 |
Low dielectric constant plasma polymerized thin film and manufacturing method thereof |
摘要 |
Disclosed is a low dielectric constant plasma polymerized thin film using linear organic/inorganic precursors and a method of manufacturing the low dielectric constant plasma polymerized thin film through plasma enhanced chemical vapor deposition and annealing using an RTA apparatus. The low dielectric constant plasma polymerized thin film is effective for the preparation of multilayered metal thin films having a thin film structure with very high thermal stability, a low dielectric constant, and superior mechanical properties.
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申请公布号 |
EP2070601(A2) |
申请公布日期 |
2009.06.17 |
申请号 |
EP20080170636 |
申请日期 |
2008.12.04 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
JUNG, DONGGEUN;LEE, SUNGWOO;WOO, JIHYUNG |
分类号 |
B05D7/24 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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