| 摘要 |
This exposure system (1000) is provided with: a first row of chambers (3001-3003) that are arranged so as to be adjacent to a C/D (9000), which is provided on a floor surface F, on a +X side; a second row of chambers that are arranged on a -Y side facing the first row of chambers; and a first control rack (200) that is adjacent to the second row of chambers on a -X side and is disposed on the -Y side facing the C/D (9000). Exposure chambers in which exposure is carried out are formed inside at least a portion of the first and second rows of chambers, and the first control rack (200) distributes, to the first and second rows of chambers, a utility supplied from below the floor surface (F). |
