发明名称 MEMS ELEMENT MANUFACTURING METHOD
摘要 The present invention provides manufacturing methods of electrostatic type MEME devices, in which planarizing the surface of a driving side electrode, reducing fluctuations in the shape of a beam, improving the performance and the uniformity are aimed at. <??>A manufacturing method according to the present invention includes the steps of: forming a substrate side electrode on a substrate, forming a fluid film before or after forming a sacrificial layer, further forming a beam having a driving side electrode on a planarized surface of the fluid film, and finally, removing the sacrificial layer. <IMAGE>
申请公布号 EP1460036(A1) 申请公布日期 2004.09.22
申请号 EP20020805883 申请日期 2002.12.16
申请人 SONY CORPORATION 发明人 IKEDA, KOICHI;KINOSHITA, TAKASHI
分类号 B81C1/00;B81B3/00;H01L21/00;(IPC1-7):B81B3/00 主分类号 B81C1/00
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