| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate inspection device of high inspection efficiency with excellent resolution, and a method and a system provided therewith for inspecting a substrate. SOLUTION: This system for inspecting the substrate includes a primary electron beam irradiation means for irradiating the substrate 11 of a sample with electron beams as primary electron beams 31a, 31b, an image projection means for receiving the primary electron beams 31a, 31b, and for guiding secondary electrons, reflected electrons and back-scattered electrons generated from the substrate 11 to be magnification-projected as secondary electron beams 32a, 32b, an electron beam detecting means for detecting the secondary electron beams 32a, 32b to be output as image signals, a display part 30 for receiving the image signals supplied from the electron beam detecting means to display an electron beam image, a signal processing means 62 for processing the image signals to output an image data, a storage means 63 for storing the image data, and a control means 29. In the system, a thin reverse face irradiation type CCD element is provided in the electron beam detecting means, to convert the secondary electron beams 32a, 32b directly into the image signals. COPYRIGHT: (C)2007,JPO&INPIT
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