| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment whose degradation in exposure accuracy caused by oscillation is reduced by estimating the oscillation of a projection optical system support using the result of position measurement in which a measurement error resulting from an environment is suppressed. <P>SOLUTION: Exposure equipment comprises a support which supports a projection optical system, an object supported in such a manner that the object can be transported to the support, a driving means for driving the object, a detecting means for detecting a mutual position between the object and the support, a control means for allowing the object to follow the support by driving the driving means based on an output of the detecting means, and an estimation means for estimating the oscillation of the support based on the output of the detecting means at the time of the following control. <P>COPYRIGHT: (C)2008,JPO&INPIT |
