发明名称 |
METHOD OF GROWING GALLIUM NITRIDE CRYSTAL |
摘要 |
A method of growing a gallium nitride crystal is provided to reduce a density of dislocations effectively by forming a stable grain boundary at an interface of two different crystal regions, in an epitaxial growth method. A mask(M) inhibiting epitaxial growth of a gallium nitride crystal is formed partially on a ground substrate(U). The gallium nitride crystal is grown epitaxially on the ground substrate in which the mask is formed, while doping carbon. A first crystal region is grown from a periphery region of the mask toward inside, and an c-axis direction is reversed in the first crystal region relative to a second crystal region grown on a region where the mask is not formed in the ground substrate.
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申请公布号 |
KR20070117490(A) |
申请公布日期 |
2007.12.12 |
申请号 |
KR20070055527 |
申请日期 |
2007.06.07 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
OKAHISA TAKUJI;MOTOKI KENSAKU;UEMATSU KOJI;NAKAHATA SEIJI;HIROTA RYU;IJIRI HIDEYUKI;KASAI HITOSHI;FUJITA SHUNSUKE;SATO FUMITAKA;MATSUOKA TORU |
分类号 |
H01L21/20;C30B23/04;C30B29/38 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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