发明名称 METHOD OF GROWING GALLIUM NITRIDE CRYSTAL
摘要 A method of growing a gallium nitride crystal is provided to reduce a density of dislocations effectively by forming a stable grain boundary at an interface of two different crystal regions, in an epitaxial growth method. A mask(M) inhibiting epitaxial growth of a gallium nitride crystal is formed partially on a ground substrate(U). The gallium nitride crystal is grown epitaxially on the ground substrate in which the mask is formed, while doping carbon. A first crystal region is grown from a periphery region of the mask toward inside, and an c-axis direction is reversed in the first crystal region relative to a second crystal region grown on a region where the mask is not formed in the ground substrate.
申请公布号 KR20070117490(A) 申请公布日期 2007.12.12
申请号 KR20070055527 申请日期 2007.06.07
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 OKAHISA TAKUJI;MOTOKI KENSAKU;UEMATSU KOJI;NAKAHATA SEIJI;HIROTA RYU;IJIRI HIDEYUKI;KASAI HITOSHI;FUJITA SHUNSUKE;SATO FUMITAKA;MATSUOKA TORU
分类号 H01L21/20;C30B23/04;C30B29/38 主分类号 H01L21/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利