发明名称 METHOD FOR PRODUCING SUBSTANCE, LASER BEAM MACHINING APPARATUS, METHOD FOR PRODUCING TFT SUBSTRATE, METHOD FOR PRODUCING MULTILAYER STRUCTURE SUBSTRATE AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for producing a base substance where a base substance is cut/divided using laser light, by which, even if dust or the like is stuck to the surface of a base substance, the base substance can be cut/divided with high precision. <P>SOLUTION: The method for producing a substrate P as a base substance is provided with: a stage where a film 48 is formed on the substrate P; a stage where the film 48 is irradiated with laser light 45, and the film 48 is transpired, so as to form a film removed part 49; a stage where the laser light 45 is further emitted so as to be connected with the film removed part 49, thus a material denatured part 47 is formed at the substrate P; a film residue detection stage where the film residue 48b in the film removed part 49 is detected; and a stage where a stress F is applied to the base substance P, so as to form divided pieces Q. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007319880(A) 申请公布日期 2007.12.13
申请号 JP20060151413 申请日期 2006.05.31
申请人 SEIKO EPSON CORP 发明人 KUROKI YASUNOBU
分类号 B23K26/38;B23K26/00;B23K26/18;B23K26/40;B23K101/40;B28D5/00;G02F1/13;G02F1/1333 主分类号 B23K26/38
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